Laser-based metal deposition encompasses a suite of directed-energy deposition methods in which a focused laser beam is used to fuse metal feedstock—commonly powder or wire—onto a substrate, building ...

Fraunhofer ILT and Etxetar are expanding the industrial adoption of Laser Metal Deposition (LMD) and extreme high-speed laser ...

Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...

A research team has developed a new thin film deposition process for tin selenide-based materials. This process utilizes the metal-organic chemical vapor deposition (MOCVD) method, enabling thin film ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...